Rigiflex lithography for nanostructure transfer

被引：95
|
作者：
Suh, D
Choi, SJ
Lee, HH [1 ]
机构：
[1] Seoul Natl Univ, Sch Chem Engn, Seoul 151744, South Korea
[2] Ctr Biotechnol Incubating, Seoul 151742, South Korea
来源：
ADVANCED MATERIALS | 2005年 / 17卷 / 12期
关键词：
D O I：
10.1002/adma.200402010
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Rigiflex lithography combines the mold rigidity of imprint lithography, which permits fine patterning, with the mold flexibility of soft lithography, allowing intimate contact of the mold with the surface substrate over a large area. A UV-curable mold based on poly(urethane acrylate) is prepared as a film on a flexible poly(ethylene terephthalate) support, allowing nanopatterns to be prepared by a bilayer-transfer technique (see Figure).
引用
收藏
页码：1554 / 1560
页数：7
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