Measurement of field emission characteristics from transition metal nitride and carbide thin films

被引：0
|
作者：
Gotoh, Y [1 ]
Liao, MY [1 ]
Tsuji, H [1 ]
Ishikawa, J [1 ]
机构：
[1] Kyoto Univ, Dept Elect Sci & Engn, Sakyo Ku, Kyoto 6068501, Japan
来源：
TECHNICAL DIGEST OF THE 16TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE | 2003年
关键词：
D O I：
暂无
中图分类号：
O69 [应用化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：35 / 36
页数：2
相关论文
共 50 条
  • [41] Field emission characteristics from graphene on hexagonal boron nitride
    Yamada, Takatoshi
    Masuzawa, Tomoaki
    Ebisudani, Taishi
    Okano, Ken
    Taniguchi, Takashi
    APPLIED PHYSICS LETTERS, 2014, 104 (22)
  • [42] Scanning tunneling microscopy observations of hafnium carbide thin films as a field emission material
    Sato, T
    Saida, M
    Horikawa, K
    Sasaki, M
    Nagao, M
    Kanemaru, S
    Matsukawa, T
    Itoh, J
    Yamamoto, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (02): : 741 - 744
  • [43] Structural Characteristics and Their Influence on the Properties of Transition Metal Nitride and Boride Films (Overview)
    Goncharov, O. A.
    Kolinko, I. S.
    Kornich, G. V.
    Khomenko, O. V.
    Shyrokorad, D. V.
    POWDER METALLURGY AND METAL CERAMICS, 2023, 62 (5-6) : 312 - 325
  • [44] Structural Characteristics and Their Influence on the Properties of Transition Metal Nitride and Boride Films (Overview)
    O. A. Goncharov
    I. S. Kolinko
    G. V. Kornich
    O. V. Khomenko
    D. V. Shyrokorad
    Powder Metallurgy and Metal Ceramics, 2023, 62 : 312 - 325
  • [45] Deposition of vanadium carbide thin films using compound target sputtering and their field emission
    Liao, MY
    Gotoh, Y
    Tsuji, H
    Ishikawa, J
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2005, 23 (05): : 1379 - 1383
  • [46] Generation and Characteristics of IV-VI transition Metal Nitride and Carbide Nanoparticles using a Reactive Mesoporous Carbon Nitride
    Alhajri, Nawal S.
    Anjum, Dalaver H.
    Hedhili, Mohamed N.
    Takanabe, Kazuhiro
    CHEMISTRYSELECT, 2016, 1 (02): : 290 - 296
  • [47] VERY HIGH CRITICAL CURRENT AND FIELD CHARACTERISTICS OF NIOBIUM NITRIDE THIN FILMS
    GAVALER, JR
    JANOCKO, MA
    PATTERSO.A
    JONES, CK
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1970, 15 (06): : 837 - &
  • [48] VERY HIGH CRITICAL CURRENT AND FIELD CHARACTERISTICS OF NIOBIUM NITRIDE THIN FILMS
    GAVALER, JR
    JANOCKO, MA
    PATTERSON, A
    JONES, CK
    JOURNAL OF APPLIED PHYSICS, 1971, 42 (01) : 54 - +
  • [49] Nanohardness measurement of carbon nitride thin films
    Kojima, I
    Xu, WT
    Fujimoto, T
    SURFACE AND INTERFACE ANALYSIS, 2001, 32 (01) : 74 - 78
  • [50] Investigation and characterisation of silicon nitride and silicon carbide thin films
    Lattemann, M
    Nold, E
    Ulrich, S
    Leiste, H
    Holleck, H
    SURFACE & COATINGS TECHNOLOGY, 2003, 174 : 365 - 369
12345