Measurement of field emission characteristics from transition metal nitride and carbide thin films

被引：0
|
作者：
Gotoh, Y [1 ]
Liao, MY [1 ]
Tsuji, H [1 ]
Ishikawa, J [1 ]
机构：
[1] Kyoto Univ, Dept Elect Sci & Engn, Sakyo Ku, Kyoto 6068501, Japan
来源：
TECHNICAL DIGEST OF THE 16TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE | 2003年
关键词：
D O I：
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中图分类号：
O69 [应用化学];
学科分类号：
081704 ;
摘要：
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页码：35 / 36
页数：2
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