Absolute diode laser-based in situ detection of HCl in gasification processes

被引:41
|
作者
Ortwein, P. [1 ,2 ]
Woiwode, W. [1 ]
Fleck, S. [4 ]
Eberhard, M. [4 ]
Kolb, T. [4 ]
Wagner, S. [1 ,3 ]
Gisi, M. [1 ]
Ebert, V. [1 ,2 ,3 ]
机构
[1] Heidelberg Univ, Inst Phys Chem, INF 253, D-69120 Heidelberg, Germany
[2] Phys Tech Bundesanstalt, D-38116 Braunschweig, Germany
[3] Tech Univ Darmstadt, Ctr Smart Interfaces, D-64287 Darmstadt, Germany
[4] Karlsruhe Inst Technol, ITC TAB, D-76344 Eggenstein Leopoldshafen, Germany
关键词
SURFACE-EMITTING LASER; MU-M; TEMPERATURE; GAS; CO; ABSORPTION; SENSOR; H2O; PRESSURE;
D O I
10.1007/s00348-010-0904-2
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
The release of HCl is an important parameter for industrial combustion and gasification processes, which must be determined in the ppm range for active process control and optimization. Based on a low power vertical-cavity surface-emitting laser (VCSEL) at 1.74 mu m, we developed a new tuneable diode laser absorption spectrometer for calibration-free, absolute in situ HCl detection using the (HCl)-Cl-35 (2 a dagger 0) R(3) absorption line with minimized cross-sensitivity to CO2 and H2O. The spectrometer was applied to in situ measurements in a gasification process (T = 1,130A degrees C, P = 1 atm, L = 28 cm) and yielded an optical resolution of 2.3 center dot 10(-4), i.e. a HCl sensitivity of 45 ppm (13 ppm center dot m).
引用
收藏
页码:961 / 968
页数:8
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