Growth, structure, and properties of uniformly a-axis oriented ferroelectric Bi3.25La0.75Ti3O12 thin films on Si(100) substrates

被引:0
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作者
Hesse, D [1 ]
Lee, HN [1 ]
Zakharov, ND [1 ]
Gösele, U [1 ]
机构
[1] Max Planck Inst Mikrostrukturphys, D-06120 Halle Saale, Saale, Germany
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中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Uniformly a-axis-oriented, epitaxially twinned Bi3.25La0.75Ti3O12 (BLT) thin films having the major spontaneous polarization entirely along the film normal were grown by pulsed laser deposition on yttria-stabilized zirconia-buffered Si(100) substrates covered with very thin SrRuO3 bottom electrodes. Using SrRuO3 bottom electrodes of a specific low thickness in combination with a relatively high growth rate and a high oxygen pressure, the volume fraction of the BLT (100) orientation, which is competing with the BLT (118) orientation, was increased up to 99%. In this way the growth of fully a-axis-oriented BLT epitaxial films was achieved, attaining a remanent polarization of 32 muC/cm(2). Initial fatigue experiments indicated hardly any fatigue after 10(9) switching cycles.
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页码:287 / 296
页数:10
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