This paper addresses the characterization of Ba0.6Sr0.4TiO3 dielectric properties on different dielectric substrates using three different components. First, for low frequencies, metal-insulator-metal (MIM) capacitors are used to determine the BST dielectric constant, loss tangent and tunability for different biasing voltages from 0-30 V showing a tunability range of 66%. For microwave frequency ranges, coplanar waveguides (CPW), and interdigital capacitors (IDCs) are investigated on silicon, R-plane sapphire (Al2O3) and magnesium oxide (MgO) substrates. CPW is used to determine the complex propagation constant, while IDCs are used to determine the BST voltage tunability from 0-55 V over 1-20 GHz. Sapphire and MgO introduce low loss tangent values of 0.03, while sapphire gives better tunability (20% at 18 GHz) than MgO (8.3% at 18 GHz).
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Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R ChinaHong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Wang, DY
Wang, Y
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Wang, Y
Wong, KH
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Wong, KH
Lor, KP
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Lor, KP
Chan, HP
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Chan, HP
Chiang, KS
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Chiang, KS
Chan, HLW
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
Chan, HLW
Choy, CL
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机构:Hong Kong Polytech Univ, Dept Appl Phys, Kowloon, Hong Kong, Peoples R China
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Chongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
Chongqing Univ, Sch Mat Sci & Engn, Chongqing 400044, Peoples R ChinaChongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
Fu, Chunlin
Cai, Wei
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Chongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R ChinaChongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
Cai, Wei
Chen, Hongwei
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Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R ChinaChongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
Chen, Hongwei
Feng, Shucheng
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Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R ChinaChongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
Feng, Shucheng
Pan, Fusheng
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Chongqing Univ, Sch Mat Sci & Engn, Chongqing 400044, Peoples R ChinaChongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
Pan, Fusheng
Yang, Chuanren
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Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R ChinaChongqing Univ Sci & Technol, Sch Met & Mat Engn, Chongqing 400050, Peoples R China
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R & D Technol Ctr, HI Cap Dept, Yageo Corp Nantze Branch, Kaohsiung 811, TaiwanR & D Technol Ctr, HI Cap Dept, Yageo Corp Nantze Branch, Kaohsiung 811, Taiwan
Chiu, Ming-Chieh
Yao, Hsiao-Chiang
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机构:R & D Technol Ctr, HI Cap Dept, Yageo Corp Nantze Branch, Kaohsiung 811, Taiwan
Yao, Hsiao-Chiang
Yao, Hsiao-Chiang
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机构:R & D Technol Ctr, HI Cap Dept, Yageo Corp Nantze Branch, Kaohsiung 811, Taiwan
Yao, Hsiao-Chiang
Huang, Chueh-Jung
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机构:R & D Technol Ctr, HI Cap Dept, Yageo Corp Nantze Branch, Kaohsiung 811, Taiwan
Huang, Chueh-Jung
Shieu, Fuh-Sheng
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机构:R & D Technol Ctr, HI Cap Dept, Yageo Corp Nantze Branch, Kaohsiung 811, Taiwan