Capillary discharge source for EUV lithography

被引：0
|
作者：
Cachoncinlle, C [1 ]
Robert, E [1 ]
Sarroukh, O [1 ]
Gonthiez, T [1 ]
Viladrosa, R [1 ]
Fleurier, C [1 ]
Pouvesle, JM [1 ]
机构：
[1] Univ Orleans, GREMI ESPEO, F-45067 Orleans 02, France
来源：
JOURNAL DE PHYSIQUE IV | 2003年 / 108卷
关键词：
D O I：
10.1051/jp4:20030620
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：169 / 172
页数：4
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