Angular distribution measurement of high-energy argon neutral and ion in a 13.56 MHz capacitively-coupled plasma

被引：6
|
作者：
Ichikawa, Keita [1 ,4 ]
Chu, Manh Hung [1 ]
Moriyama, Makoto [1 ]
Nakahara, Naoya [1 ]
Suzuki, Haruka [1 ,2 ]
Iino, Daiki [3 ]
Fukumizu, Hiroyuki [3 ]
Kurihara, Kazuaki [3 ]
Toyoda, Hirotaka [1 ,2 ,4 ]
机构：
[1] Nagoya Univ, Dept Elect, Chikusa Ku, Furo Cho, Nagoya, Aichi 4648603, Japan
[2] Nagoya Univ, Ctr Low Temp Plasma Sci, Chikusa Ku, Furo Cho, Nagoya, Aichi 4648603, Japan
[3] Kioxia Corp, Inst Memory Technol Res & Dev, Isogo Ku, Yokohama, Kanagawa 2350017, Japan
[4] Natl Inst Fus Sci, 322-6,Oroshi, Toki, Gifu 5095292, Japan
来源：
APPLIED PHYSICS EXPRESS | 2021年 / 14卷 / 12期
关键词：
ASPECT-RATIO TRENCHES; PROFILE EVOLUTION; DISCHARGES; SCATTERING; SIMULATION; TRANSPORT; ELECTRODE; SILICON; CL-2;
D O I：
10.35848/1882-0786/ac33c4
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Angular distributions of high energy neutrals and ions, impinging on an RF-biased electrode in a 13.56 MHz capacitively-coupled argon plasma were investigated. Ions and neutrals were introduced into a drift chamber that was directly connected to the RF electrode. A two-dimensional beam image was measured by a micro-channel plate. Neutral and ion beams were separated by an electrostatic deflector in the drift chamber. Angular distribution widths for ion and neutral were less than 1 degrees at self-bias voltages above 300 V and monotonically decreased with increasing the self-bias voltage. Neutral angular distribution width was larger than that of ion, irrespective of self-bias voltage. (C) 2021 The Japan Society of Applied Physics
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页数：5
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