Angular distribution measurement of high-energy argon neutral and ion in a 13.56 MHz capacitively-coupled plasma

被引：6

作者：

Ichikawa, Keita ^{[1
,4
]}

Chu, Manh Hung ^{[1
]}

Moriyama, Makoto ^{[1
]}

Nakahara, Naoya ^{[1
]}

Suzuki, Haruka ^{[1
,2
]}

Iino, Daiki ^{[3
]}

Fukumizu, Hiroyuki ^{[3
]}

Kurihara, Kazuaki ^{[3
]}

Toyoda, Hirotaka ^{[1
,2
,4
]}

机构：

[1] Nagoya Univ, Dept Elect, Chikusa Ku, Furo Cho, Nagoya, Aichi 4648603, Japan

[2] Nagoya Univ, Ctr Low Temp Plasma Sci, Chikusa Ku, Furo Cho, Nagoya, Aichi 4648603, Japan

[3] Kioxia Corp, Inst Memory Technol Res & Dev, Isogo Ku, Yokohama, Kanagawa 2350017, Japan

[4] Natl Inst Fus Sci, 322-6,Oroshi, Toki, Gifu 5095292, Japan

来源：

APPLIED PHYSICS EXPRESS | 2021年 / 14卷 / 12期

关键词：

ASPECT-RATIO TRENCHES; PROFILE EVOLUTION; DISCHARGES; SCATTERING; SIMULATION; TRANSPORT; ELECTRODE; SILICON; CL-2;

D O I：

10.35848/1882-0786/ac33c4

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Angular distributions of high energy neutrals and ions, impinging on an RF-biased electrode in a 13.56 MHz capacitively-coupled argon plasma were investigated. Ions and neutrals were introduced into a drift chamber that was directly connected to the RF electrode. A two-dimensional beam image was measured by a micro-channel plate. Neutral and ion beams were separated by an electrostatic deflector in the drift chamber. Angular distribution widths for ion and neutral were less than 1 degrees at self-bias voltages above 300 V and monotonically decreased with increasing the self-bias voltage. Neutral angular distribution width was larger than that of ion, irrespective of self-bias voltage. (C) 2021 The Japan Society of Applied Physics

引用

页数：5

共 48 条

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