Growth of SnO2 thin films on self-assembled layers of the short-chain alkoxysilane

被引:8
|
作者
Zhang, JL [1 ]
Li, W [1 ]
Zhai, Y [1 ]
Yang, H [1 ]
Wang, YP [1 ]
机构
[1] Tianjin Univ, Sch Chem Engn & Technol, Key Lab Green Chem Technol, Tianjin 300072, Peoples R China
基金
中国国家自然科学基金;
关键词
self-assemble; alkoxysilane; thin films; SnO2;
D O I
10.1016/j.apsusc.2004.09.114
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The growth behavior and structure of self-assembled layers of short-chain alkoxysilane of 3-mercaptopropyltrimethoxysilane (MPS) on hydroxyl-terminated substrates were investigated using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and contact angle measurements. It was indicated that the self-assembled layers of MPS formed island structures and deposited integrally on the substrates. Further, the deposition of SnO2 thin films on the MPS-coated substrates was studied using X-ray diffraction (XRD), AFM, XPS, and the high-resolution stylus profilometers. It was proved that uniform and compact SnO2 thin films indeed formed on the self-assembled layers of short-chain MPS. The as-deposited SnO2 films were cassiterite and showed the property of semiconductors, which would have wide applications in gas sensors, solar cells, catalysts, etc. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:94 / 101
页数:8
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