The growth behavior and structure of self-assembled layers of short-chain alkoxysilane of 3-mercaptopropyltrimethoxysilane (MPS) on hydroxyl-terminated substrates were investigated using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and contact angle measurements. It was indicated that the self-assembled layers of MPS formed island structures and deposited integrally on the substrates. Further, the deposition of SnO2 thin films on the MPS-coated substrates was studied using X-ray diffraction (XRD), AFM, XPS, and the high-resolution stylus profilometers. It was proved that uniform and compact SnO2 thin films indeed formed on the self-assembled layers of short-chain MPS. The as-deposited SnO2 films were cassiterite and showed the property of semiconductors, which would have wide applications in gas sensors, solar cells, catalysts, etc. (c) 2004 Elsevier B.V. All rights reserved.
Shenzhen Key Lab. of Micro-nano Photonic Information Technology, School of Electronic Science and Technology, Shenzhen University, Shenzhen 518060, China
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Shenzhen Key Lab. of Micro-nano Photonic Information Technology, School of Electronic Science and Technology, Shenzhen University, Shenzhen 518060, China
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Univ Tokyo, Dept Chem, Bunkyo Ku, Tokyo 1138654, JapanUniv Tokyo, Dept Chem, Bunkyo Ku, Tokyo 1138654, Japan
Fukumoto, Michitaka
Nakao, Shoichiro
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Univ Tokyo, Dept Chem, Bunkyo Ku, Tokyo 1138654, Japan
KAST, Kawasaki, Kanagawa 2130012, JapanUniv Tokyo, Dept Chem, Bunkyo Ku, Tokyo 1138654, Japan
Nakao, Shoichiro
Hirose, Yasushi
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Univ Tokyo, Dept Chem, Bunkyo Ku, Tokyo 1138654, Japan
KAST, Kawasaki, Kanagawa 2130012, JapanUniv Tokyo, Dept Chem, Bunkyo Ku, Tokyo 1138654, Japan
Hirose, Yasushi
Hasegawa, Tetsuya
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Univ Tokyo, Dept Chem, Bunkyo Ku, Tokyo 1138654, Japan
KAST, Kawasaki, Kanagawa 2130012, JapanUniv Tokyo, Dept Chem, Bunkyo Ku, Tokyo 1138654, Japan