Development of metal vapor vacuum are ion source in Thailand

被引：3
|
作者：
Davydov, S
Yotsombat, B [1 ]
Yu, LD
Pramukkul, P
Charoennukul, R
Vilaithong, T
机构：
[1] Chiang Mai Univ, Fac Sci, Dept Phys, Chiang Mai 50200, Thailand
[2] Chiang Mai Univ, Inst Sci & Technol Res & Dev, Chiang Mai 50200, Thailand
来源：
SURFACE & COATINGS TECHNOLOGY | 2000年 / 131卷 / 1-3期
关键词：
vacuum arc; metal plasma; ion deposition;
D O I：
10.1016/S0257-8972(00)00775-1
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A metal vapor vacuum are (MEVVA) ion source has been constructed and installed at Chiang Mai University. The cathode-insulator-trigger electrode system and the cooling efficiency were found to be reliable during the source operation (without the cathode-insulator replacement), with total number of pulses of approximately 3 X 10(5) and with the repetition rate of up to 5.5 pps at 200 A are current. The main are and plasma ion current-voltage characteristics have been measured. The maximum plasma ion saturation current obtained at 3 cm distance from the cathode was approximately 6 A and the coefficient of transformation of the are current to the ion current was found to approach 3%. Preliminary experiments with copper film deposition on some dielectric substrates are discussed. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：39 / 43
页数：5
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