Electrochemical and X-ray investigations on the system (Cu,Hg,Zn) with regard to the Cu-Zn interference

被引：4

作者：

Werkmeister, KS ^{[1
]}

Bund, A ^{[1
]}

Schwitzgebel, G ^{[1
]}

机构：

[1] Univ Saarlandes, Fachrichtung Phys Chem, D-66123 Saarbrucken, Germany

来源：

ELECTROCHIMICA ACTA | 1998年 / 43卷 / 12-13期

关键词：

nanocrystalline "CuZn" compound; diffractometry; cyclic voltammetry; potentiometry; amalgam electrode;

D O I：

10.1016/S0013-4686(97)00302-2

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

EMF and CV measurements on ternary amalgams (Cu,Hg,Zn) were performed with Cu and Zn contents varying over a wide range, even above saturation. It was shown that the known interference between Cu and Zn in analytical chemistry is caused by an intermetallic compound, whose formation from gamma-CuHg and Zn is slow compared with the electrode kinetics of Zn and Cu af Hg. Its electrode potential is similar to 150 mV more postive than the Zn potential. The diffractogram of this phase leads to the conclusion that the intermetallic compound is the beta-phase "CuZn" distributed as nanocrystallites in Hg. Nanocrystallinity of "CuHg" is a prior condition for the interference to occur. (C) 1998 Elsevier Science Ltd. All rights reserved.

引用

页码：1843 / 1850

页数：8

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