Contribution of Molecular Simulation to the characterization of porous low-k materials

被引：0
|
作者：
Broussous, Lucile [1 ]
Lepinay, Matthieu [1 ,2 ,3 ,4 ]
Coasne, Benoit [5 ]
Licitra, Christophe [2 ,3 ]
Bertin, Francois [2 ,3 ]
Rouessac, Vincent [4 ]
Ayral, Andre [4 ]
机构：
[1] STMicroelectronics, 850 Rue Jean Monnet, F-38926 Crolles, France
[2] Univ Grenoble Alpes, F-38000 Grenoble, France
[3] CEA, LETI, F-38054 Grenoble 9, France
[4] UM, CNRS, ENSCM, Inst Europeen Membranes, F-34095 Montpellier 5, France
[5] MIT, CNRS, UMI 3466, Multiscale Mat Sci Energy & Environm, Cambridge, MA 02139 USA
来源：
2015 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE AND 2015 IEEE MATERIALS FOR ADVANCED METALLIZATION CONFERENCE (IITC/MAM) | 2015年
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：123 / 125
页数：3
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