Contribution of Molecular Simulation to the characterization of porous low-k materials

被引：0

作者：

Broussous, Lucile ^{[1
]}

Lepinay, Matthieu ^{[1
,2
,3
,4
]}

Coasne, Benoit ^{[5
]}

Licitra, Christophe ^{[2
,3
]}

Bertin, Francois ^{[2
,3
]}

Rouessac, Vincent ^{[4
]}

Ayral, Andre ^{[4
]}

机构：

[1] STMicroelectronics, 850 Rue Jean Monnet, F-38926 Crolles, France

[2] Univ Grenoble Alpes, F-38000 Grenoble, France

[3] CEA, LETI, F-38054 Grenoble 9, France

[4] UM, CNRS, ENSCM, Inst Europeen Membranes, F-34095 Montpellier 5, France

[5] MIT, CNRS, UMI 3466, Multiscale Mat Sci Energy & Environm, Cambridge, MA 02139 USA

来源：

2015 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE AND 2015 IEEE MATERIALS FOR ADVANCED METALLIZATION CONFERENCE (IITC/MAM) | 2015年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：123 / 125

页数：3

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