Design and fabrication of a highly manufacturable MEMS probe card for high speed testing

被引:19
|
作者
Kim, Bong-Hwan [1 ]
Kim, Jong-Bok [2 ]
机构
[1] Univ Illinois, Dept Mech Sci & Engn, Urbana, IL 61801 USA
[2] UniTest Inc, MEMS Grp, Yongin 446930, Gyeonggi Do, South Korea
关键词
D O I
10.1088/0960-1317/18/7/075031
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have designed and fabricated a micro-electro mechanical system (MEMS) probe card, which is suitable for a manufactured product, to achieve a deflection of 50 mu m at a force of 1.5 gram ( g) and a probe structure height of 720 mu m. The cantilever structure consists of a tip and beam of Ni-Co, a bump of Ni and AuSn solder between them. In order to make the probe card compliant, all moving structures such as the tip, beam and bumps were electroplated with nickel, nickel-cobalt and gold solutions. The fabricated MEMS probe card can endure more than 150 mu m overdrive and prevent tip damage from particles owing mainly to its high bump height and enhanced high frequency test, putting capacitors between the driving voltage and ground. Based on our experimental results, the average contact force was approximately 1.41 gram force (gf) at 50 mu m of deflection and the total path resistance was less than 5 Omega for all pins, while the leakage current was less than 5 nA.
引用
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页数:8
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