Characterization and Modeling of Self-Heating in DMOS Transistors

被引:0
|
作者
Pfost, Martin [1 ]
机构
[1] Reutlingen Univ, Robert Bosch Ctr Power Elect, Alteburgstr 150, D-72762 Reutlingen, Germany
关键词
ELECTROTHERMAL SIMULATION; HIGH-TEMPERATURES; THERMAL RUNAWAY; POWER-MOSFETS; LOW-VOLTAGE;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Advanced power semiconductors such as DMOS transistors are key components of modern power electronic systems. Recent discrete and integrated DMOS technologies have very low area-specific on-state resistances so that devices with small sizes can be chosen. However, their power dissipation can sometimes be large, for example in fault conditions, causing the device temperature to rise significantly. This can lead to excessive temperatures, reduced lifetime, and possibly even thermal runaway and subsequent destruction. Therefore, it is required to ensure already in the design phase that the temperature always remains in an acceptable range. This paper will show how self-heating in DMOS transistors can be experimentally determined with high accuracy. Further, it will be discussed how numerical electrothermal simulations can be carried out efficiently, allowing the accurate assessment of self-heating within a few minutes. The presented approach has been successfully verified experimentally for device temperatures exceeding 500 degrees C up to the onset of thermal runaway.
引用
收藏
页码:3 / 10
页数:8
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