Material processing by plasma shock wave generated in an inverse Z-pinch "plasma expander"

被引：0
|
作者：
Aramaki, EA [1 ]
de Moraes, MB [1 ]
Machida, M [1 ]
机构：
[1] Univ Estadual Paulista Julio Mesquita Filho, Fac Engn, Dept Quim & Fis, BR-12516410 Guaratingueta, SP, Brazil
来源：
PLASMA PHYSICS | 2003年 / 669卷
关键词：
D O I：
暂无
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
The applicability of plasma shock wave for material processing was investigated using modified inverse Z-pinch device. Shock wave expanding speed and plasma spectral analysis were studied using an internal magnetic,probe and spatially collimated light spectroscopy. The material processing capability of the device was shown by many different surface analysis techniques such as AES, IRS, EPM and SEM. The interactions between a plasma shock wave of similar to4x10(6) cm/s speed with a Si substrate surface shows some ion implantation capability using a nitrogen plasma and thin film formation using a methane plasma.
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页码：339 / 342
页数：4
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