Preparation of potassium tantalate niobate thin films by chemical solution deposition and their characterization

被引:16
|
作者
Bursík, J [1 ]
Zelezny, V
Vanek, P
机构
[1] Acad Sci Czech Republ, Inst Inorgan Chem, CZ-25068 Rez, Czech Republic
[2] Acad Sci Czech Republ, Inst Phys, Prague 18221, Czech Republic
关键词
films; tantalates; chemical solution deposition; spectroscopy;
D O I
10.1016/j.jeurceramsoc.2005.03.021
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Potassium tantalate niobate (KTaxNb1-xO3, (KTN), where x=0, 0.21, 0.36, 0.53, 0.74, 0.82, 0.86, and 1) thin films of perovskite structure were prepared by chemical solution deposition (CSD) on Si and SiO2 glass substrates. A homogeneous and stable precursor solution was obtained by dissolving potassium, niobium and tantalum isobutoxides in absolute isobutanol and an addition of diethanolamine as a modifier. The film quality was determined by annealing temperature and heating regime, Al2O3 "chemical" buffer layer and KNbO3 seeding layer. Optimum conditions for film preparation were found. It was approved by X-ray diffraction (XRD) that the films have the wanted pseudocubic perovskite structure. Infrared transmittance was measured for broad range of Ta/Nb ratios. The spectra show continuous transformation from KTaO3 to KNbO3 and indicate that the optical axis lies in the plane of the film. (c) 2005 Elsevier Ltd. All rights reserved.
引用
收藏
页码:2151 / 2154
页数:4
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