Extended Depth of Focus Metalenses for Achromatic Computational Imaging

被引:0
|
作者
Huang, Luocheng [1 ]
Whitehead, James [1 ]
Colburn, Shane [1 ]
Majumdar, Arka [1 ,2 ]
机构
[1] Univ Washington, Dept Elect & Comp Engn, Seattle, WA 98195 USA
[2] Univ Washington, Dept Phys, Seattle, WA 98195 USA
关键词
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暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We demonstrate high-quality, full-color imaging using extended depth of focus (EDOF) metalenses and computational reconstruction. We use rotationally symmetrical phase masks to mitigate asymmetrical artifacts found in the traditional cubic EDOF systems. (C) 2021 The Author(s)
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页数:2
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