Electron field emission from sp 2-induced insulating to metallic behaviour of amorphous carbon (a-C) films

被引：3
|
作者：
Mahanandia, Pitamber [1 ]
Viswakarma, P. N. [1 ]
Bhotla, Prasad Vishnu [1 ]
Subramanyam, S. V. [1 ]
Nanda, Karuna Kar [2 ]
机构：
[1] Indian Inst Sci, Dept Phys, Bangalore 560012, Karnataka, India
[2] Indian Inst Sci, Mat Res Ctr, Bangalore 560012, Karnataka, India
来源：
BULLETIN OF MATERIALS SCIENCE | 2010年 / 33卷 / 03期
关键词：
Amorphous carbon; transport; field emission; DIAMOND-LIKE CARBON; THIN-FILMS; SURFACE-TREATMENT; RAMAN-SPECTRA; DEPOSITION; THRESHOLD; NANOTUBES; ARC;
D O I：
10.1007/s12034-010-0033-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The influence of concentration and size of sp (2) cluster on the transport properties and electron field emissions of amorphous carbon films have been investigated. The observed insulating to metallic behaviour from reduced activation energy derived from transport measurement and threshold field for electron emission of a-C films can be explained in terms of improvements in the connectivity between sp (2) clusters. The connectivity is resulted by the cluster concentration and size. The concentration and size of sp (2) content cluster is regulated by the coalescence of carbon globules into clusters, which evolves with deposition conditions.
引用
收藏
页码：215 / 220
页数：6
相关论文
共 50 条
  • [21] Electron emission from a-C films deposited by RF sputtering
    Wang, Xiao Guang
    Watamori, Michio
    Madono, Hiroyuki
    Arimatsu, Daiki
    Kawano, Yuichi
    Oura, Kenjiro
    Hirao, Takashi
    Technology Reports of the Osaka University, 1999, 49 (2338): : 37 - 42
  • [22] Thickness-independent electron field emission from tetrahedral amorphous carbon films
    Zhao, JP
    Chen, ZY
    Wang, X
    Shi, TS
    Yano, T
    APPLIED PHYSICS LETTERS, 2000, 76 (02) : 191 - 193
  • [23] A study of electron field emission as a function of film thickness from amorphous carbon films
    Forrest, RD
    Burden, AP
    Silva, SRP
    Cheah, LK
    Shi, X
    APPLIED PHYSICS LETTERS, 1998, 73 (25) : 3784 - 3786
  • [24] A study of field electron emission from thin amorphous-carbon-nitride films
    Chen, J
    Xu, NS
    Wang, EG
    Deng, SZ
    Chen, DH
    Wei, AX
    CHINESE PHYSICS LETTERS, 1998, 15 (07): : 539 - 541
  • [25] Field electron emission from amorphous carbon films grown in pure methane plasma
    Baek, YG
    Ikuno, T
    Ryu, JT
    Honda, S
    Katayama, M
    Oura, K
    Hirao, T
    APPLIED SURFACE SCIENCE, 2002, 185 (3-4) : 243 - 247
  • [26] Influence of sp2 clusters on the field emission properties of amorphous carbon thin films
    Carey, JD
    Forrest, RD
    Khan, RUA
    Silva, SRP
    APPLIED PHYSICS LETTERS, 2000, 77 (13) : 2006 - 2008
  • [27] Field electron emission characteristics of nitrogenated tetrahedral amorphous carbon films
    Zhang, XW
    Cheung, WY
    Wong, SP
    THIN SOLID FILMS, 2003, 429 (1-2) : 261 - 266
  • [28] Cathodoluminescence and electron field emission of boron-doped a-C:N films
    Hsieh, WJ
    Lai, SH
    Chan, LH
    Chang, KL
    Shih, HC
    CARBON, 2005, 43 (04) : 820 - 826
  • [29] Hard and sp2-rich amorphous carbon structure formed by ion beam irradiation of fullerene, a-C and polymeric a-C:H films
    Baptista, DL
    Zawislak, FC
    DIAMOND AND RELATED MATERIALS, 2004, 13 (10) : 1791 - 1801
  • [30] Stress-induced electron emission from nanocomposite amorphous carbon thin films
    Poa, CH
    Lacerda, RG
    Cox, DC
    Silva, SRP
    Marques, FC
    APPLIED PHYSICS LETTERS, 2002, 81 (05) : 853 - 855
12345