Glancing incident MeV ion beams for total reflection PIXE (TPIXE) and RBS surface analysis

被引:5
|
作者
vanKan, JA
Vis, RD
机构
[1] Faculty of Physics and Astronomy, Vrije Universiteit, 1081 HV Amsterdam
关键词
D O I
10.1016/0168-583X(95)01355-5
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
In a total reflection geometry at small incident angles phi (0-35 mrad), MeV proton and alpha beams were used to analyse Au and Cu layers on flat quartz substrates by detection of X-rays and backscattered protons. The reflected proton beams were detected as a function of incident angle phi. An improved model for theoretical X-ray yield calculations is developed. These calculations showed that a proton beam of 2.5 MeV will be totally reflected from a Au atomic surface layer at an incident angle smaller than 8 mrad. At these small angles the backscattered protons and alpha particles show a pattern which indicates atomic layer depth resolution.
引用
收藏
页码:373 / 377
页数:5
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