Level set method for micro-fabrication simulations

被引:0
|
作者
Baranski, Maciej [1 ]
Kasztelanic, Rafal [1 ]
Albero, Jorge [2 ]
Nieradko, Lukasz [2 ,3 ]
Gorecki, Christophe [2 ]
机构
[1] Univ Warsaw, Fac Phys, Pasteura 7, PL-02093 Warsaw, Poland
[2] FEMTO ST, Dept MN2S, F-25030 Besancon, France
[3] Wroclaw Res Ctr EIT Ltd, PL-54006 Wroclaw, Poland
来源
MICRO-OPTICS 2010 | 2010年 / 7716卷
关键词
microtechnology simulations; LevelSet method; Finite Element Method; dynamic mesh; isotropic etching; surface tension; SILICON;
D O I
10.1117/12.853836
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The article describes application of Level Set method for two different microfabrication processes. First is shape evolution of during reflow of the glass structure. Investigated problem were approximated by viscous flow of material thus kinetics of the process were known from physical model. Second problem is isotropic wet etching of silicon. Which is much more complicated because dynamics of the shape evolution is strongly coupled with time and geometry shapes history. In etching simulations Level Set method is coupled with Finite Element Method (FEM) that is used for calculation of etching acid concentration that determine geometry evolution of the structure. The problem arising from working with FEM with time varying boundaries was solved with the use of the dynamic mesh technique employing the Level Set formalism of higher dimensional function for geometry description. Isotropic etching was investigated in context of mico-lenses fabrication. Model was compared with experimental data obtained in etching of the silicon moulds used for micro-lenses fabrication.
引用
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页数:9
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