X-ray topography for nondestructive characterization of advanced materials.

被引：0

作者：

Hentschel, MP ^{[1
]}

Lange, A

Harbich, KW

Ekenhorst, D

Schors, JV

机构：

[1] BAM, Bereich Zerstorungsfreie Prufung, Berlin, Germany

[2] BAM, Lab 8 32, Berlin, Germany

来源：

MATERIALPRUFUNG | 1998年 / 40卷 / 05期

关键词：

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

X-ray topography is characterized by the spatially resolved detection of scattering of a sample. It combines both the advantages of radiographic imaging and the analytical information revealed by X-ray scattering like wide and small angle diffraction, refraction and total reflection. Scanning techniques under small- and wide angle scattering conditions permit the topographic characterization of any crystalline or amorphous solid or liquid. New topographic methods and applications to nonmetallics are presented.

引用

页码：170 / 174

页数：5

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