X-ray topography for nondestructive characterization of advanced materials.

被引：0
|
作者：
Hentschel, MP [1 ]
Lange, A
Harbich, KW
Ekenhorst, D
Schors, JV
机构：
[1] BAM, Bereich Zerstorungsfreie Prufung, Berlin, Germany
[2] BAM, Lab 8 32, Berlin, Germany
来源：
MATERIALPRUFUNG | 1998年 / 40卷 / 05期
关键词：
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
X-ray topography is characterized by the spatially resolved detection of scattering of a sample. It combines both the advantages of radiographic imaging and the analytical information revealed by X-ray scattering like wide and small angle diffraction, refraction and total reflection. Scanning techniques under small- and wide angle scattering conditions permit the topographic characterization of any crystalline or amorphous solid or liquid. New topographic methods and applications to nonmetallics are presented.
引用
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页码：170 / 174
页数：5
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