Capacitance-voltage modeling of metal-ferroelectric-semiconductor capacitors based on epitaxial oxide heterostructures

被引:21
|
作者
Choi, Woong [1 ,2 ]
Kim, Sunkook [2 ]
Jin, Yong Wan [2 ]
Lee, Sang Yoon [2 ]
Sands, Timothy D. [1 ]
机构
[1] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
[2] Samsung Elect, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi, South Korea
关键词
FIELD-EFFECT TRANSISTOR;
D O I
10.1063/1.3561751
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report a quantitative investigation on the capacitance-voltage (C-V) modeling of metal-ferroelectric-semiconductor epitaxial heterostructures based on a theoretical model. Within the carrier concentration between 10(17) and 10(21) cm(-3), calculated C-V curves were consistent with measurements exhibiting from a significant asymmetry to a typical butterfly shape resembling that of a metal-ferroelectric-metal capacitor. The behavior of the C-V curves can be understood by the width of the depletion region and the extent of the depolarization field. These results suggest that quantitative understanding on the electrical behavior of oxide heterostructures is possible with C-V measurements with potentially important implications on their device applications. (C) 2011 American Institute of Physics. [doi:10.1063/1.3561751]
引用
收藏
页数:3
相关论文
共 50 条
  • [1] Hysteretic metal-ferroelectric-semiconductor capacitors based on PZT/ZnO heterostructures
    Cagin, E.
    Chen, D. Y.
    Siddiqui, J. J.
    Phillips, J. D.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2007, 40 (08) : 2430 - 2434
  • [2] Capacitance-voltage measurements of monolayer MoS2 metal-oxide-semiconductor capacitors
    Yang, Hae In
    Choi, Woong
    MICROELECTRONIC ENGINEERING, 2021, 238
  • [3] Photonic high-frequency capacitance-voltage characterization of interface states in metal-oxide-semiconductor capacitors
    Kim, DM
    Kim, HC
    Kim, HT
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2002, 49 (03) : 526 - 528
  • [4] Modeling of metal-ferroelectric-semiconductor field effect transistors
    Macleod, TC
    Ho, FD
    INTEGRATED FERROELECTRICS, 1998, 21 (1-4) : 127 - 143
  • [5] Evaluation of capacitance-voltage characteristic and memory window of metal-ferroelectric-insulator-silicon capacitors
    Zheng, X. J.
    Sun, J.
    Zhang, J. J.
    Tang, M. H.
    Li, W.
    APPLIED PHYSICS LETTERS, 2008, 93 (21)
  • [6] Influence of interface traps inside the conduction band on the capacitance-voltage characteristics of InGaAs metal-oxide-semiconductor capacitors
    Taoka, Noriyuki
    Yokoyama, Masafumi
    Kim, Sang Hyeon
    Suzuki, Rena
    Iida, Ryo
    Takenaka, Mitsuru
    Takagi, Shinichi
    APPLIED PHYSICS EXPRESS, 2016, 9 (11)
  • [7] The Impact of Light Illumination on Capacitance-Voltage Characteristics of Constant-Current-Stressed Metal-Oxide-Semiconductor Capacitors
    Omura, Yasuhisa
    JORDAN JOURNAL OF ELECTRICAL ENGINEERING, 2022, 8 (01): : 1 - 16
  • [8] MEASUREMENT OF CAPACITANCE-VOLTAGE CHARACTERISTICS OF METAL - OXIDE - SEMICONDUCTOR STRUCTURES BY PULSE METHOD
    BLOMNIEK, EA
    KONTSEVO.YA
    TEMPER, EM
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1968, 1 (08): : 1061 - &
  • [9] Metal-oxide-semiconductor capacitance-voltage characteristics and band offsets for Si1-yCy/Si heterostructures
    Rim, K
    Mitchell, TO
    Singh, DV
    Hoyt, JL
    Gibbons, JF
    Fountain, G
    APPLIED PHYSICS LETTERS, 1998, 72 (18) : 2286 - 2288
  • [10] An investigation of capacitance-voltage hysteresis in metal/high-k/In0.53Ga0.47As metal-oxide-semiconductor capacitors
    Lin, Jun
    Gomeniuk, Yuri Y.
    Monaghan, Scott
    Povey, Ian M.
    Cherkaoui, Karim
    O'Connor, Eamon
    Power, Maire
    Hurley, Paul K.
    JOURNAL OF APPLIED PHYSICS, 2013, 114 (14)