HIGH-RESOLUTION GLYPH-INSPECTION BASED SECURITY SYSTEM

被引:7
|
作者
Simske, Steven J. [1 ]
Adams, Guy [2 ]
机构
[1] Hewlett Packard Labs, 3404 E Harmony Rd,MS 36, Ft Collins, CO 80528 USA
[2] Hewlett Packard Labs, Bristol, Avon BS34 8QZ, England
关键词
Image forensics; CMOS imaging; authentication; print parasitics; security; counterfeit detection;
D O I
10.1109/ICASSP.2010.5495416
中图分类号
O42 [声学];
学科分类号
070206 ; 082403 ;
摘要
This paper describes the use of a 1:1 magnification 3.5 micron true resolution Dyson Relay lens-based 3 MPixel USB CMOS imaging device (DR CID) and software forensic image analysis system. The device enables the simultaneous capture of both intentional printing shapes and unintentional printing artifacts caused by the printing process and the interaction of the ink with the substrate on which printing occurs. The custom image analysis system written for the DR CID device allows even a single printed character to simultaneously provide fiducial marking, inspection information, authentication and forensics. We report herein on the sensitivity of the system and initial results for the reliable authentication of a printed character using DR CID hardware devices.
引用
收藏
页码:1794 / 1797
页数:4
相关论文
共 50 条
  • [1] A new high-resolution photomask inspection system for contamination detection
    Mu, Bo
    Dayal, Aditya
    Yiin, Lih-Huah
    Zhua, Jinggang
    Miller, John
    Inderhees, Gregg
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXII, PTS 1 AND 2, 2008, 6922 (1-2):
  • [2] High-resolution IC inspection technique
    Ippolito, SB
    Swan, AK
    Goldberg, BB
    Ünlü, MS
    METROLOGY-BASED CONTROL FOR MICRO-MANUFACTURING, 2001, 4275 : 126 - 137
  • [3] High-resolution machine vision inspection
    Wright Industries Inc
    Sens (Peterborough, NH), 11 (4 pp):
  • [4] A high-speed high-resolution vision system for the inspection of TFT LCD
    Kim, JH
    Ahn, S
    Jeon, JW
    Byun, JE
    ISIE 2001: IEEE INTERNATIONAL SYMPOSIUM ON INDUSTRIAL ELECTRONICS PROCEEDINGS, VOLS I-III, 2001, : 101 - 105
  • [5] High-resolution mask inspection in advanced fab
    Maelzer, Stephanie
    Poock, Andre
    Reese, Bryan
    Bhattacharyya, Kaustuve
    Mirzaagha, Farzin
    Cox, Stephen
    Lang, Michael
    Photomask Technology 2006, Pts 1 and 2, 2006, 6349 : U259 - U270
  • [6] High-resolution UV wavelength reticle inspection
    Merrill, M
    Garcia, H
    Schuda, S
    Odisho, W
    Wiley, J
    PHOTOMASK AND X-RAY MASK TECHNOLOGY V, 1998, 3412 : 568 - 578
  • [7] High-resolution optical inspection system for fast detection and classification of surface defects
    Ye, Ruifang
    Chang, Ming
    Pan, Chia-Sheng
    Chiang, Cheng An
    Gabayno, Jacque Lynn
    INTERNATIONAL JOURNAL OF OPTOMECHATRONICS, 2018, 12 (01) : 1 - 10
  • [8] A high-speed high-resolution ultrasonic inspection machine
    Downs, J
    Zhang, PH
    Peterson, ML
    IEEE-ASME TRANSACTIONS ON MECHATRONICS, 1999, 4 (03) : 301 - 311
  • [9] Development of a high-energy-resolution EDXRD system with a CdTe detector for security inspection
    Chen, Yifan
    Wang, Xin
    Song, Qinghua
    Xu, Jie
    Mu, Baozhong
    AIP ADVANCES, 2018, 8 (10)
  • [10] Optical high-resolution image-based defect inspection on compound semiconductors
    Trautzsch, Thomas
    Mapelli, Alessandro
    Berndorfer, Timm
    Czogalla, Christian
    Pfuhl, Christoph
    2023 IEEE INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE, IITC AND IEEE MATERIALS FOR ADVANCED METALLIZATION CONFERENCE, MAM, IITC/MAM, 2023,