Infrared Matrix Isolation Study of the Thermal and Photochemical Reactions of Ozone with Trimethylgallium

被引:3
|
作者
Sriyarathne, H. Dushanee M. [1 ]
Gudmundsdottir, Anna D. [1 ]
Ault, Bruce S. [1 ]
机构
[1] Univ Cincinnati, Dept Chem, Cincinnati, OH 45221 USA
来源
JOURNAL OF PHYSICAL CHEMISTRY A | 2015年 / 119卷 / 12期
基金
美国国家科学基金会;
关键词
ATOMIC LAYER DEPOSITION; OXIDE THIN-FILMS; CHEMICAL-VAPOR-DEPOSITION; 266; NM; SPECTRA; GROWTH; SPECTROSCOPY; OXYGEN; TRIMETHYLALUMINUM; COMPLEX;
D O I
10.1021/jp5117917
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The thermal and photochemical reactions of (CH3)(3)Ga and O-3 have been explored using a combination of matrix isolation, infrared spectroscopy, and theoretical calculations. Experimental data using twin jet deposition and theoretical calculations demonstrate the formation of multiple product species after deposition, annealing to 35 K, and UV irradiation of the matrices. The products were identified as (CH3)(2)GaOCH3, (CH3)(2)GaCH2OH, (CH3)(CH3O)Ga(OCH3), (CH3)(2)GaCHO, and (CH3)Ga(OCH3)(CH2OH). Product identifications were confirmed by annealing and irradiation behavior, O-18 substitution experiments, and high level theoretical calculations. Merged jet deposition led to a number of stable late reaction products, including C2H6, CH3OH, and H2CO. A white solid film was also noted on the walls of the merged (flow reactor) region of the deposition system, likely due to the formation of Ga2O3.
引用
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页码:2834 / 2844
页数:11
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