Normally-off AlGaN/GaN power tunnel-junction FETs

被引:5
|
作者
Chen, Hongwei [1 ]
Yuan, Li [1 ]
Zhou, Qi [1 ]
Zhou, Chunhua [1 ]
Chen, Kevin J. [1 ]
机构
[1] Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Kowloon, Hong Kong, Peoples R China
关键词
normally-off; AlGaN/GaN heterostructure; tunnel-junction; Schottky source; MOSFET; GATE; DRAIN; HEMT;
D O I
10.1002/pssc.201100338
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We present normally-off AlGaN/Gan power tunnel-junction FETs (TJ-FETs) with high breakdown voltage, low off-state leakage current and low specific onresistance. The TJ-FETs exhibit normally-off operation in an otherwise normally-on as-grown sample owing to a current controlling scheme different from the conventional FETs. The high 2DEG density in AlGaN/GaN heterostructure results in a thin tunnel barrier whose effective thickness is controlled by an overlaying gate electrode. This tunnel junction is controlled by an overlapping gate and deliver highly efficient quantum tunnelling, enabling normally-off operation. A positive gate bias results in a nanometer-thick barrier with high tunnelling current, while a zero gate bias leads to a thicker barrier that effectively blocks the current flow. High tunnel current (326 mA/mm), low off-state leakage (10(-8) mA/mm) and high off-state breakdown voltage (557 V) are obtained on a standard GaN-on-Si platform featuring a 1.8 mu m buffer. (C) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:871 / 874
页数:4
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