A new method to reduce the dark current of GaN based Schottky barrier ultraviolet photodetector
被引:0
|
作者:
Zhou, Mei
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机构:
Chinese Agr Univ, Dept Appl Phys, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
Zhou, Mei
[2
]
Chang, Qing-Ying
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h-index: 0
机构:
Chinese Agr Univ, Dept Appl Phys, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
Chang, Qing-Ying
[2
]
Zhao, De-Gang
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
Zhao, De-Gang
[1
]
机构:
[1] Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
[2] Chinese Agr Univ, Dept Appl Phys, Beijing 100083, Peoples R China
GaN;
Schottky structure;
ultraviolet photodetector;
dark current;
D O I:
10.7498/aps.57.2548
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
A new method to reduce the dark current of GaN based Schottky barrier ultraviolet photodetector is proposed. In comparision with conventional i-CaN/n(+)-GaN structure, an additional thin p-GaN cap layer is introduced on the i-GaN(n(-)-GaN) in the new structure. The simulation results showed that the additional layer makes the dark current to decrease in the photodetector due to the increase of the Schottky barrier height. The effects of thickness and carrier concentration of p-GaN layer on the dark current of the photodetector were also studied. It is suggested that the dark current of the new structure device could be better reduced by employing p-GaN with higher carrier concentration as the cap layer.