The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography

被引:11
|
作者
Wu, Jun [1 ]
Geng, Zhaoxin [2 ]
Xie, Yiyang [1 ]
Fan, Zhiyuan [3 ]
Su, Yue [3 ]
Xu, Chen [1 ]
Chen, Hongda [3 ]
机构
[1] Beijing Univ Technol, Minist Educ, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
[2] Minzu Univ China, Sch Informat Engn, Beijing 10083, Peoples R China
[3] Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
基金
国家重点研发计划; 北京市自然科学基金; 中国国家自然科学基金;
关键词
laser interference lithograph; PDMS; periodic nanostructures;
D O I
10.3390/nano9010073
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We report a method for fabricating periodic nanostructures on the surface of polydimethylsiloxane (PDMS) using laser interference lithography. The wave-front splitting method was used for the system, as the period and duty cycle can be easily controlled. Indium tin oxide (ITO) glass reveals favorable characteristics for controlling the standing waves distributed in the vertical direction, and was selected as the rigid substrate for the curing of the PDMS prepolymer, photoresist spin coating, and exposure processes. Periodic nanostructures such as gratings, dot, and hole arrays were prepared. This efficient way of fabricating large area periodic nanoscale patterns will be useful for surface plasmonic resonance and wearable electronics.
引用
收藏
页数:8
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