CVD preparation of alumina-supported tungsten nitride and its activity for thiophene hydrodesulfurization

被引:27
|
作者
Nagai, M [1 ]
Suda, T [1 ]
Oshikawa, K [1 ]
Hirano, N [1 ]
Omi, S [1 ]
机构
[1] Tokyo Univ Agr & Technol, Grad Sch Bioapplicat & Syst Engn, Dept Adv Mat, Koganei, Tokyo 1848588, Japan
关键词
chemical vapor deposition; hydrodesulfurization; supported catalyst; tungsten nitride; WCl6;
D O I
10.1016/S0920-5861(98)00459-3
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
Tungsten nitride was synthesized on gamma-alumina pellet and quartz plate using the chemical vapor deposition (CVD) method in a stream of WCl6, NH3, H-2 and Ar gases at 700 degrees C under reduced pressure. The effects of the supports, catalyst preparation and pretreatment on the activities of alumina-supported tungsten nitrides for the hydrodesulfurization (HDS) of thiophene at 300 degrees C and atmospheric pressure were discussed. The alumina-supported tungsten nitride catalyst prepared by the CVD method had a surface area of 161 m(2)g(-1). The micropore distribution of the alumina-supported CVD catalyst varying with deposition time was analyzed by Dolimore-Heal method. The surface area of the CVD catalysts depended on the supports such as alumina, quartz, and zeolite Y. Thiophene HDS showed a constant activity of the CVD/alumina catalysts deposited for 30 and 60 min, but the 90 min-deposited catalyst was activated after the decreased activity at an initial stage. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:29 / 37
页数:9
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