On-site comparison of Quantum Hall Effect resistance standards of the CMI and the BIPM: ongoing key comparison BIPM.EM-K12

被引：3
|
作者：
Gournay, Pierre [1 ]
Rolland, Benjamin [1 ]
Kucera, Jan [2 ]
Vojackova, Lucie [2 ]
机构：
[1] Bur Int Poids & Mesures, Pavillon Breteuil, F-92312 Sevres, France
[2] Czech Inst Metrol CMI, Radiova 1136-3, Prague 10200 15, Czech Republic
来源：
METROLOGIA | 2017年 / 54卷
关键词：
D O I：
10.1088/0026-1394/54/1A/01014
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页数：3
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