Electronic structure analysis of threading screw dislocations in 4H-SiC using electron holography

被引:12
|
作者
Chung, Suk [1 ]
Berechman, Ronen A. [1 ]
McCartney, Martha R. [2 ]
Skowronski, Marek [1 ]
机构
[1] Carnegie Mellon Univ, Dept Mat Sci & Engn, Pittsburgh, PA 15213 USA
[2] Arizona State Univ, Dept Phys, Tempe, AZ 85287 USA
关键词
BIAS LEAKAGE CURRENT; SURFACE-DEFECTS; BREAKDOWN; GAN; CHARGE; LIMITS;
D O I
10.1063/1.3544066
中图分类号
O59 [应用物理学];
学科分类号
摘要
Off-axis electron holography has been used to map the electrostatic potential distribution of threading screw dislocations in differently n-doped 4H-SiC epitaxial layers. Observed phase contrast indicated the presence of a negatively charged dislocation core. Comparison between experimental and simulated potential profiles indicated that the density of trapped charges increased for a higher doped epilayer. Assuming a single level of the trap at the core, the ionization energy of the trap was calculated to be 0.89 +/- 0.22 eV. (C) 2011 American Institute of Physics. [doi:10.1063/1.3544066]
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