The Effect of Deposition Temperature to Photoconductivity Properties of Amorphous Carbon Thin Films Deposited By Thermal CVD

被引:0
|
作者
Mohamad, F. [1 ,2 ]
Suriani, A. B. [2 ]
Noor, U. M. [1 ]
Rusop, M. [1 ,2 ]
机构
[1] Univ Teknol MARA, Fac Elect Engn, Solar Cell Lab, Shah Alam, Selangor, Malaysia
[2] Univ Teknol MARA, Inst Sci, NANO SciTech Ctr, Shah Alam, Selangor, Malaysia
关键词
Camphor oil; Amorphous carbon; Thermal CVD; Photoconductivity; CHEMICAL-VAPOR-DEPOSITION; PHOTOVOLTAIC PROPERTIES; CAMPHORIC CARBON;
D O I
10.1063/1.3469680
中图分类号
O59 [应用物理学];
学科分类号
摘要
Amorphous carbon (a-C) thin films were deposited by thermal chemical vapor deposition (CVD) using camphor oil on quartz substrates. The photoconductivity and optical properties of the thin films were studied with varying the deposition temperatures ranging from 650 to 900 degrees C. The film deposited at 750 degrees C shows large photoconductivity compare to other films. The optical characterization shows that the optical band gap of the thin films decreased from 0.65 to similar to 0.0eV with increasing the deposition temperature due to the increase of sp(2) bonded carbon configuration. The electrical conductivity of the thin films grown at higher temperature is much higher compared with the thin films deposited at low temperature.
引用
收藏
页码:361 / +
页数:2
相关论文
共 50 条
  • [1] Iodine Doping of Amorphous Carbon Thin Films Deposited by Thermal CVD
    Dayana, K.
    Fadzilah, A. N.
    Rusop, M.
    ADVANCED MATERIALS ENGINEERING AND TECHNOLOGY, 2012, 626 : 834 - 838
  • [2] Amorphous Carbon Thin Films Deposited by Thermal CVD using Camphoric Carbon as Precursor
    Ahmad, Nurfadzilah
    Tahir, Nur Ayuni
    Rusop, Mohamad
    MEMS, NANO AND SMART SYSTEMS, PTS 1-6, 2012, 403-408 : 646 - 650
  • [3] Properties of Iodine Doped Amorphous Carbon Thin Films Grown by Thermal CVD
    Dayana, K.
    Fadzilah, A. N.
    Ishak, A.
    Rusop, M.
    NANOSYNTHESIS AND NANODEVICE, 2013, 667 : 294 - 299
  • [4] Deposition of amorphous carbon thin films by pulsed RF plasma CVD
    Kim, DS
    Kang, TW
    JOURNAL OF CHEMICAL ENGINEERING OF JAPAN, 2005, 38 (08) : 593 - 599
  • [5] Effect of deposition temperature on the properties of amorphous silicon carbide thin films
    Huran, J.
    Hotovy, I.
    Pezoltd, J.
    Balalykin, N. I.
    Kobzev, A. P.
    THIN SOLID FILMS, 2006, 515 (02) : 651 - 653
  • [6] Effect of Gas Flow Rate on The Properties of Amorphous Carbon Thin Films Prepared by Thermal CVD using Camphoric Carbon Precursor
    Dayana, K.
    Fadzilah, A. N.
    Ishak, A.
    Siran, Yosri M.
    Rejab, Syahril Anuar M.
    Asis, Ahmad Jaril
    Tahirrudin, Syawaluddin
    Rusop, M.
    NANOSCIENCE, NANOTECHNOLOGY AND NANOENGINEERING, 2014, 832 : 423 - +
  • [7] AFM Images of Undoped Amorphous Carbon Thin Films Deposited by Bias-assisted Thermal-CVD
    Ishak, A.
    Amirul, M.
    Rusop, M.
    2012 10TH IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS (ICSE), 2012, : 78 - 81
  • [8] Deposition of Amorphous Carbon Thin Films by Aerosol-Assisted CVD Method
    Fadzilah, A. N.
    Dayana, K.
    Rusop, M.
    8TH INTERNATIONAL CONFERENCE ON NANOSCIENCE AND NANOTECHNOLOGY 2017 (NANO-SCITECH 2017), 2018, 1963
  • [9] PROPERTIES OF MODIFIED AMORPHOUS CARBON THIN FILMS DEPOSITED BY PECVD
    Stoica, Adrian
    Mocanu, Valentin
    Cupera, Jan
    Kelar, Lukas
    Bursikova, Vilma
    CHEMICKE LISTY, 2012, 106 : S1499 - S1503
  • [10] Optical and structural properties of amorphous carbon thin films deposited by microwave surface-wave plasma CVD
    Adhikari, S
    Adhikary, S
    Omer, AMM
    Rusop, M
    Uchida, H
    Soga, T
    Umeno, M
    DIAMOND AND RELATED MATERIALS, 2006, 15 (2-3) : 188 - 192