Design of ultrabright 270 keV DC photoelectron gun for ultrafast electron diffraction

被引:1
|
作者
Yang, Jing [1 ,2 ]
Yu, Yuying [1 ]
Qi, Yingpeng [3 ]
Hu, Jianbo [1 ,2 ,4 ]
机构
[1] China Acad Engn Phys, Inst Fluid Phys, Lab Shock Wave & Detonat Phys, Mianyang 621900, Sichuan, Peoples R China
[2] Southwest Univ Sci & Technol, State Key Lab Environm Friendly Energy Mat, Mianyang 621010, Sichuan, Peoples R China
[3] Shanghai Jiao Tong Univ, Sch Phys & Astron, Ctr Ultrafast Sci & Technol, Shanghai 200240, Peoples R China
[4] Sichuan Civil Mil Integrat Inst, Mianyang 621010, Sichuan, Peoples R China
基金
中国国家自然科学基金;
关键词
MICROSCOPY; RESOLUTION; DYNAMICS;
D O I
10.1063/5.0012248
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Compact DC photoelectron guns of high-voltage are highly desired to output ultrabright and ultrashort electron pulses for accessing irreversible processes by using the ultrafast electron diffraction (UED) technique. The high-voltage breakdown, however, is a major technical barrier to providing an intense electric field strength in a condensed space between the photocathode and the anode when the voltage is over 120 kV. In this work, by adopting the concept of voltage division, we propose a novel design of ultrabright near-relativistic DC photoelectron guns for UED. The electric field breakdown mainly caused by micro-particle collision could be avoided such that an optimized three-level acceleration DC gun can work with an electron energy of up to 270 keV and an electric field strength of up to 15 MV/m. N-particle simulations of the electron pulse propagation show that, with such a DC electron gun, it is possible to have ultrabright and ultrashort electron probe pulses with no jitter issue.
引用
收藏
页数:6
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