An ultra-compact polarization insensitive directional coupler

被引：0
|
作者：
Shi, Y. [1 ,2 ]
Anand, S. [2 ]
He, S. [1 ,2 ]
机构：
[1] Royal Inst Technol, Joint Res Ctr Photon, Stockholm, Sweden
[2] Royal Inst Technol KTH, Dept Microelect & Appl Phys, SE-16440 Kista, Sweden
来源：
AOE 2008: ASIA OPTICAL FIBER COMMUNICATION AND OPTOELECTRONIC EXPOSITION AND CONFERENCE | 2009年
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We investigate the lag-effect in the dry etching process. In one etch step, asymmetric waveguides with a shallow groove in between can be fabricated. This special property can be utilized for the design of an ultra-compact polarization insensitive directional coupler. (C) 2008 Optical Society of America.
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页数：3
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