Charge-based model for symmetric double-gate MOSFETs with inclusion of channel doping effect

被引:9
|
作者
Zhang, Lining [1 ]
Zhang, Jian [1 ]
Song, Yan [1 ]
Lin, Xinnan [2 ]
He, Jin [1 ,2 ]
Chan, Mansun [3 ]
机构
[1] Peking Univ, Sch Elect Engn & Comp Sci, Inst Microelect, Key Lab Microelect Devices & Circuits,TSRC, Beijing 100871, Peoples R China
[2] Peking Univ, Shenzhen Grad Sch, Key Lab Integrated Microsyst, Micro & Nanoelect Device & Integrated Technol Grp, Shenzhen 518055, Peoples R China
[3] Hong Kong Univ Sci & Technol, Dept ECE, Kowloon, Hong Kong, Peoples R China
关键词
THRESHOLD VOLTAGE; COMPACT MODEL;
D O I
10.1016/j.microrel.2010.04.005
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a unified charge-based model for symmetric double-gate (DG) MOSFETs with a wide range of channel doping concentrations. From one dimensional (1D) Poisson-Boltzmann equation in the DG MOSFET structure, an accurate inversion charge model is proposed, which predicts the inversion charge density precisely from weak inversion, through moderate inversion and finally to strong inversion region for both heavily doped and lightly doped condition. Based on that, the unified drain current model is developed from Pao-Sah's dual integral. The unified terminal charge and trans-capacitance models are derived out from Ward and Dutton's linear-charge-partition scheme. Extensive numerical simulations are performed on DG MOSFETs to verify the unified charge-based models and good agreements between them are obtained, proving the validity of the proposed model for further circuit simulation. (C) 2010 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1062 / 1070
页数:9
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