The high-volume production of heterojunction bipolar transistors

被引:0
|
作者
Pan, N [1 ]
Hill, D [1 ]
Rose, C [1 ]
McCullough, D [1 ]
Rice, P [1 ]
Vu, DP [1 ]
Hong, K [1 ]
Farley, C [1 ]
机构
[1] Kopin Corp, Taunton, MA 02780 USA
关键词
GaAs; Current Gain; Heterojunction Bipolar Transistor; Specific Contact Resistance; MOCVD Growth;
D O I
10.1007/s11837-998-0459-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The insertion of advanced microwave devices into high-volume applications is critically dependent upon a robust and reproducible epitaxial growth technology accompanied with a reproducible process technology. The precise control of the material and device parameters is essential to maintain a high-yield process, which leads to a low-cost product. Although AlGaAs/GaAs heterojunction bipolar transistors have been widely demonstrated in many company research laboratories and universities, the transition from a laboratory environment to high-volume production requires a thorough understanding of the metalorganic chemical vapor deposition growth process and its correlation with device performance. In this work, high-performance AlGaAs/GaAs heterojunction bipolar transistors grown by MOCVD with excellent control in the device parameter tolerances have been demonstrated in very high volumes.
引用
收藏
页码:45 / 47
页数:3
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