Oxygen assisted iodine atom production in an RF discharge

被引:0
|
作者
Mikheyev, Pavel A. [1 ,2 ]
Demyanov, Andrey V. [3 ]
Ufimtsev, Nikolay I. [1 ]
Kochetov, Igor V. [3 ]
Azyazov, Valeriy N. [1 ,2 ]
Napartovich, Anatoly P. [3 ]
Heaven, Michael C. [2 ,4 ]
机构
[1] Lebedev Phys Inst, Samara, Russia
[2] Samara State Aerosp Univ, Samara, Russia
[3] SRC RF Troitsk Inst Innovat & Fus Res, Troitsk, Moscow Province, Russia
[4] Emory Univ, Atlanta, GA 30322 USA
关键词
Oxygen-iodine laser; iodine atoms; plasma chemistry; RF discharge; methyl iodide dissociation; LASER; FLOW;
D O I
10.1117/12.2218350
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Experiments and modeling of CH3I dissociation in the plasma generated by a 40 MHz RF discharge were performed. A discharge chamber of an original design, consisting of quartz tubes between two planar electrodes, permitted the production of iodine atoms with number densities up to 2x10(16) cm(-3). In this discharge chamber, contamination of the walls of the tubes did not hinder discharge stability, providing a good iodine production rate. Addition of oxygen into Ar:CH3I mixture resulted in a substantial increase in iodine extraction efficiency. When the discharge power reached 200 W, complete CH3I dissociation in a Ar: CH3I:O-2 mixture was observed. The fraction of discharge power spent on iodine atom production at a 0.17 mmol/s CH3I flow rate was 16%.
引用
收藏
页数:6
相关论文
共 50 条
  • [41] Development of the electric discharge oxygen-iodine laser
    Carroll, David L.
    Verdeyen, Joseph T.
    King, Darren M.
    Palla, Andrew D.
    Laystrom, Julia K.
    Benavides, Gabriel F.
    Zimmerman, Joseph W.
    Woodard, Brian S.
    Solomon, Wayne C.
    XVI INTERNATIONAL SYMPOSIUM ON GAS FLOW, CHEMICAL LASERS, AND HIGH-POWER LASERS, PTS 1 AND 2, 2007, 6346
  • [42] SIMULATION OF RF-ASSISTED DISCHARGE LAUNCHING IN A TOKAMAK
    FONTANESI, M
    LAMPIS, G
    PINOSCHI, P
    MAROLI, C
    PETRILLO, V
    NUOVO CIMENTO DELLA SOCIETA ITALIANA DI FISICA B-GENERAL PHYSICS RELATIVITY ASTRONOMY AND MATHEMATICAL PHYSICS AND METHODS, 1985, 87 (01): : 23 - 34
  • [43] Chemical oxygen-iodine laser with external production of iodine atoms in CH3I/Ar dc glow discharge
    Mikheyev, P. A.
    Zagidullin, M. V.
    Azyazov, V. N.
    APPLIED PHYSICS B-LASERS AND OPTICS, 2010, 101 (1-2): : 7 - 10
  • [44] Oxygen-iodine active medium with external production of iodine in a dc glow discharge - art. no. 63460J
    Mikheyev, Pavel A.
    Azyazov, Valeriy N.
    Mezhenin, Adrew V.
    Ufimtsev, Nikolay I.
    Shepelenko, Alexander A.
    Voronov, Anatoly I.
    Kupryaev, Nikolay V.
    Pichugin, Sergey Yu.
    Vorobyov, Mikhail V.
    XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, Pts 1 and 2, 2007, 6346 : J3460 - J3460
  • [45] Mechanism of pulse discharge production of iodine atoms from CF3I molecules for a chemical oxygen-iodine laser
    Kochetov, I. V.
    Napartovich, A. P.
    Vagin, N. P.
    Yuryshev, N. N.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42 (05)
  • [46] Chemical oxygen-iodine laser with external production of iodine atoms in CH3I/Ar dc glow discharge
    P. A. Mikheyev
    M. V. Zagidullin
    V. N. Azyazov
    Applied Physics B, 2010, 101 : 7 - 10
  • [47] RF-plasma-assisted fast atom beam etching
    Ono, Takahito, 1600, (39):
  • [48] RF-plasma-assisted fast atom beam etching
    Ono, T
    Orimoto, N
    Lee, S
    Simizu, T
    Esashi, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (12B): : 6976 - 6979
  • [49] RF-plasma assisted fast atom beam etching
    Ono, T
    Simizu, T
    Orimoto, N
    Lee, S
    Masayoshi, E
    MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS, 2000, : 200 - 201
  • [50] Mechanism of singlet oxygen deactivation in an electric discharge oxygen-iodine laser
    Azyazov, V. N.
    Mikheyev, P. A.
    Pershin, A. A.
    Torbin, A. P.
    Heaven, M. C.
    QUANTUM ELECTRONICS, 2014, 44 (12) : 1083 - 1084