Adsorption of thin films of titanium on tungsten (111) surface

被引:4
|
作者
Kucharczyk, R. [1 ]
Jurczyszyn, L. [1 ]
Hadzel, P. [1 ]
机构
[1] Univ Wroclaw, Inst Expt Phys, PL-50204 Wroclaw, Poland
关键词
Tungsten; Titanium; Adsorption; Surface relaxation and reconstruction; Density-functional calculations; TOTAL-ENERGY CALCULATIONS; ULTRATHIN METAL-FILMS; WAVE BASIS-SET; ELECTRONIC-PROPERTIES; W(111); LAYERS;
D O I
10.1016/j.susc.2010.05.021
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The structural and electronic properties of titanium-covered (111) surface of tungsten are studied via first-principles density-functional calculations. The dominant role played by substrate-adlayer interactions in the formation of thin films of Ti on W(111) explains the observed isomorphous growth for Ti depositions up to a full physical overlayer, with adatoms most favorably arranged in substrate-lattice-continuation sites. The optimized atomic configurations indicate substantial interplane relaxations following the contraction-contraction-expansion pattern, characteristic also of the clean W(111) substrate. Modification of the surface electronic properties of the Ti/W(111) system is examined for increasing adsorbate coverage with emphasis placed on the formation and localization properties of adsorbate-induced resonances. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:1524 / 1530
页数:7
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