Identifying and Rationalizing the Differing Surface Reactions of Low-Energy Electrons and Ions with an Organometallic Precursor

Surface reactions of electrons and ions with physisorbed organometallic precursors are fundamental processes in focused electron and ion beam-induced deposition (FEBID and FIBID, respectively) of metal-containing nanostructures. Markedly different surface reactions occur upon exposure of nanometer-scale films of (eta(5)-Cp)Fe(CO)(2)Re(CO)(5) to low-energy electrons (500 eV) compared to argon ions (860 eV). Electron-induced surface reactions are initiated by electronic excitation and fragmentation of (eta(5)-Cp)Fe(CO)(2)Re(CO)(5), causing half of the CO ligands to desorb. Residual CO ligands decompose under further electron irradiation. In contrast, Ar+-induced surface reactions proceed by an ion-molecule momentum/energy transfer process, causing the desorption of all CO ligands without significant ion-induced precursor desorption. This initial decomposition step is followed by ion-induced sputtering of the deposited atoms. The fundamental insights derived from this study can be used not only to rationalize the composition of deposits made by FEBID and FIBID but also to inform the choice of a charged particle deposition strategy and the design of new precursors for these emerging nanofabrication tools.