The effect of nitrogen on the passivation mechanisms and electronic properties of chromium oxide layers

被引：41
|
作者：
Lavigne, O. [1 ]
Alemany-Dumont, C. [1 ]
Normand, B. [1 ]
Berger, M. N. [2 ]
Duhamel, C. [2 ]
Delichere, P. [3 ]
机构：
[1] Univ Lyon, INSA Lyon, MATEIS, CNRS UMR 5510, F-69621 Villeurbanne, France
[2] MINES ParisTech, Ctr Mat, CNRS UMR 7633, F-91003 Evry, France
[3] Univ Lyon, IRCELYON, CNRS UMR 5256, F-69626 Villeurbanne, France
来源：
CORROSION SCIENCE | 2011年 / 53卷 / 06期
关键词：
EIS; Polarization; TEM; XPS; Passivity; NITRIDED STAINLESS-STEELS; METAL BIPOLAR PLATES; PEM FUEL-CELL; THERMAL NITRIDATION; CARBON-STEEL; FILMS; CORROSION; POLYMER; BEHAVIOR; 316L;
D O I：
10.1016/j.corsci.2011.02.026
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this work, several Physical Vapour Deposition (PVD) films of chromium and chromium nitride were grown by adjusting the nitrogen flow rate. It was found that films containing lower nitrogen content exhibited better corrosion behaviour in relation to their microstructure. Moreover, the resistivities of the samples were found to increase with N content due to a decrease in the number of metallic bonds in the coatings and a loss of oxide layer conductivity. The latter is linked to a decrease of charge carrier density by the incorporation of NH4+ species into the passive layers, which decreases cation vacancy density. (C) 2011 Elsevier Ltd. All rights reserved.
引用
收藏
页码：2087 / 2096
页数：10
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