Comparison of heterostructure-emitter bipolar transistors (HEBTs) with InGaAs/GaAs superlattice and quantum-well base structures

被引:0
|
作者
Tsai, Jung-Hui [1 ]
Hsu, I-Hsuan [2 ]
Li, Chien-Ming [2 ]
Su, Ning-Xing [2 ]
Wu, Yi-Zhen [2 ]
Huang, Yin-Shan [2 ]
机构
[1] Natl Kaohsiung Normal Univ, Dept Elect Engn, Kaohsiung, Taiwan
[2] Natl Kaohsiung Normal Univ, Dept Phys, Kaohsiung 802, Taiwan
关键词
InGaP/GaAs; heterostructure-emitter; superlattice-base; quantum-well base; turn-on voltage; offset voltage;
D O I
10.1016/j.sse.2008.02.006
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The characteristics of InGaP/GaAs heterostructure-emitter bipolar transistors (HEBTs) including conventional GaAs bulk base, InGaAs/GaAs superlattice-base, and InGaAs quantum-well base structures are presented and compared by two-dimensional simulation analysis. Among of the devices, the superlattice-base device exhibits a highest collector current, a highest current gain and a lowest base-emitter turn-on voltage attributed to the increased charge storage of minority carriers in the InGaAs/GaAs superlattice-base region by tunneling behavior. The relatively low turn-on voltage can reduce the operating voltage and collector-emitter offset voltage for low power consumption in circuit applications. However, as to the quantum-well base device, the electrons injecting into the InGaAs well are blocked by the p(+)-GaAs bulk base and it causes a great quantity of electron storage within the small energy-gap n-type GaAs emitter layer, which significantly increases the base recombination current as well as degrades the collector current and current gain. (C) 2008 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1018 / 1023
页数:6
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