Retention and desorption behavior of helium in oxidized V-4Cr-4Ti alloy

被引:15
|
作者
Oku, D. [1 ]
Yamada, T. [1 ]
Hirohata, Y. [1 ]
Yamauchi, Y. [1 ]
Hino, T. [1 ]
机构
[1] Hokkaido Univ, Grad Sch Engn, Div Quantum Sci & Engn, Lab Plasma Phys & Engn,Kita Ku, Sapporo, Hokkaido 0608628, Japan
基金
日本学术振兴会;
关键词
D O I
10.1016/j.jnucmat.2007.03.068
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Retention and desorption behaviors of helium in oxidized and non-oxidized V-4Cr-4Ti alloy samples were investigated after helium ion irradiation at room temperature using a thermal desorption spectroscopy. The ion energy and fluence were 5 keV and (0.5-10) x 10(21) He/m(2), respectively. An oxidized layer with a thickness of 100 nm was prepared by thermal oxidation. The surface density of blisters produced by helium ion irradiation in the oxidized sample was lower than that in the non-oxidized one. The helium desorption behavior depended significantly on the fluence. In the lower fluence regime, the retained helium desorbed mainly at around 1300 K in both samples. As fluence increased, several desorption peaks appeared in the low temperature region in both samples. However, the peak temperatures were different. The amount of helium retained in the oxidized sample was lower than that in the non-oxidized sample. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:864 / 868
页数:5
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