Fabrication of flexible mold for hybrid nanoimprint-soft lithography

被引：8
|
作者：
Zhang, Jian [1 ,2 ]
Cui, Bo [1 ,2 ]
Ge, Haixiong [3 ]
机构：
[1] Univ Waterloo, Dept Elect & Comp Engn, Waterloo, ON N2L 3G1, Canada
[2] Univ Waterloo, WIN, Waterloo, ON N2L 3G1, Canada
[3] Nanjing Univ, Dept Mat Sci & Engn, Nanjing 210008, Peoples R China
来源：
MICROELECTRONIC ENGINEERING | 2011年 / 88卷 / 08期
关键词：
Sacrificial mold; Hybrid nanoimprint-soft lithography; PMGI; Electron beam lithography; NM HALF-PITCH; HIGH-RESOLUTION;
D O I：
10.1016/j.mee.2010.12.107
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We fabricated molds consisting of features in rigid UV-cured resist on an elastic poly(dimethylsiloxane) (PDMS) support for hybrid nanoimprint-soft lithography. The molds were duplicated through coating and curing a UV-curable resist onto a poly(dimethyl glutarimide) (PMGI) sacrificial mold that was subsequently dissolved using an aqueous basic solution that did not swell the PDMS support. Three methods are developed to fabricate the PMGI sacrificial mold: direct imprint into it at >200 degrees C, imprint into another polymer layer at sub-100 degrees C and then RIE transfer the pattern into PMGI, and direct writing by e-beam lithography. Using the hybrid nanoimprint-soft lithography process, we demonstrated pattern replication with sub-10 nm features size. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码：2192 / 2195
页数：4
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