SURFACE AMORPHIZATION IN "CHROMIUM-ON-SILICON" SYSTEM RESULTED BY COMPRESSION PLASMA ACTION

被引：0

作者：

Uglov, Vladimir ^{[1
]}

Kvasov, Nicolai ^{[2
]}

Petukhou, Yury ^{[2
]}

Astashynski, Valyantsin ^{[3
]}

Kuzmitski, Anton ^{[3
]}

机构：

[1] Belarusian State Univ, 4 Nezavisimosti Ave, Minsk 220030, BELARUS

[2] Belarusian State Univ, Informat & Radioelect, Minsk 220013, BELARUS

[3] Natl Acad Sci Belarus, BI Stepanov Phys Inst, Minsk 220068, BELARUS

来源：

TMS 2010 139TH ANNUAL MEETING & EXHIBITION - SUPPLEMENTAL PROCEEDINGS, VOL 2: MATERIALS CHARACTERIZATION, COMPUTATION AND MODELING AND ENERGY | 2010年

关键词：

silicides; compression plasma; solidification; dendrites;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The results of studies of pre-surface layers structure, phase and elemental composition of plasma-intermixed "chromium-on-silicon" system are reported. Plasma intermixing was carried out by quasi-stationary compression plasma flows. Power density absorbed by target varied from 0,6 to 1,5 GW/m(2), pulse duration was about 100 mu s. XRD-studies revealed the formation of amorphous phase and crystalline hexagonal chromium disilicide CrSi2. Coordination sphere radius of amorphous phase estimates about 1,7 angstrom and increases with power density. SEM-studies showed amorphous phase to locate in the pre-surface layer (about 1 pm thickness). In accordance with XMA results it contains about 35 at.% of chromium and 65 at.% of silicon. Thermal stability of amorphous phase after 400 and 600 degrees C anneal is discussed.

引用

页码：633 / +

页数：3

共 44 条

[1] Silicon surface exfoliation under compression plasma flow action
Dojcinovic, I. P.
Kuraica, M. M.
Randjelovic, D.
Matic, M.
Puric, J.
2006 25TH INTERNATIONAL CONFERENCE ON MICROELECTRONICS, VOLS 1 AND 2, PROCEEDINGS, 2006, : 145 - +
[2] Bulk periodic structures formation on monocrystalline silicon surface under the action of compression plasma flows
Astashynski, V. M.
Ananin, S. I.
Emelyarlenko, A. S.
Kostyukevich, E. A.
Kuzmitzky, A. M.
Zhvavy, S. P.
Uglov, V. V.
APPLIED SURFACE SCIENCE, 2006, 253 (04) : 1866 - 1872
[3] Creation of silicon submicron structures by compression plasma flow action
Puric, J
Astashynski, VM
Dojcinovic, IP
Kuraica, MM
VACUUM, 2004, 73 (3-4) : 561 - 566
[4] Silicon surface modification by quasistationary compression plasma flow
Dojcinovic, I. P.
Kuraica, M. M.
Obradovic, B. M.
Puric, J.
CZECHOSLOVAK JOURNAL OF PHYSICS, 2006, 56 : B205 - B210
[5] The effect of dense compression plasma flow on silicon surface morphology
Uglov, VV
Anishchik, VM
Astashynski, VV
Astashynski, VM
Ananin, SI
Askerko, VV
Kostyukevich, EA
Kuz'mitski, AM
Kvasov, NT
Danilyuk, AL
SURFACE & COATINGS TECHNOLOGY, 2002, 158 : 273 - 276
[6] Dynamics of thermal action of compression plasma flows on germanium surface
Ananin, S.I. (ananin@hmti.ac.by), 1600, Begell House Inc. (17):
[7] Material surface damage by quasistationary compression plasma flow action
Dojcinovic, Ivan P.
Kuraica, Milorad M.
Puric, Jagos
VACUUM, 2010, 85 (05) : 596 - 600
[8] Formation of submicron cylindrical structures at silicon surface exposed to a compression plasma flow
V. V. Uglov
V. M. Anishchik
V. V. Astashynski
V. M. Astashynski
S. I. Ananin
V. V. Askerko
E. A. Kostyukevich
A. M. Kuz’mitski
N. T. Kvasov
A. L. Danilyuk
Journal of Experimental and Theoretical Physics Letters, 2001, 74 : 213 - 215
[9] Formation of submicron cylindrical structures at silicon surface exposed to a compression plasma flow
Uglov, VV
Anishchik, VM
Astashynski, VV
Astashynski, VM
Ananin, SI
Askerko, VV
Kostyukevich, EA
Kuz'mitski, AM
Kvasov, NT
Danilyuk, AL
JETP LETTERS, 2001, 74 (04) : 213 - 215
[10] Nitriding of steel and titanium surface layers under the action of compression plasma flows
Cherenda, N. N.
Shimanskii, V. I.
Uglov, V. V.
Astashinskii, V. M.
Ukhov, V. A.
JOURNAL OF SURFACE INVESTIGATION, 2012, 6 (02): : 319 - 325

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