Nucleation mechanism of polycrystalline diamond film deposited on ceramic alumina by microwave plasma chemical vapor deposition

被引：3
|
作者：
Xia, YB
Mo, YW
Wang, Y
Huang, XQ
Chen, DM
Wang, H
机构：
来源：
CHINESE PHYSICS LETTERS | 1996年 / 13卷 / 07期
关键词：
D O I：
10.1088/0256-307X/13/7/021
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Polycrystalline diamond films have been deposited on ceramic alumina substrates by microwave plasma chemical vapor deposition method, Variation of the emission spectra in the microwave plasma with the microwave power and the vapor pressure in the reaction chamber is studied, respectively. Relationships between the hydrogen atomic spectra and the average energy of the electrons in the plasma, as well as the mechanism of diamond film deposition on ceramic alumina are discussed.
引用
收藏
页码：557 / 560
页数：4
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