Multilayer EUV/x-ray polychromators for plasma diagnostics

被引：6

作者：

Shmaenok, LA

Platonov, YY

Salashchenko, NN

Sorokin, AA

Simanovskii, DM

Golubev, AV

Belik, VP

Bobashev, SV

Bijkerk, F

Louis, E

Meijer, FG

Etlicher, B

Grudsky, AY

机构：

[1] INST PHYS MICROSTRUCT,NIZHNII NOVGOROD 603600,RUSSIA

[2] EURATOM ASSOC,FOM,INST PLASMA PHYS,NL-3439 MN NIEUWEGEIN,NETHERLANDS

[3] ECOLE POLYTECH,F-91128 PALAISEAU,FRANCE

[4] SEIFERT ROENTGEN & KO AO,ST PETERSBURG 195220,RUSSIA

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1996年 / 80卷

关键词：

D O I：

10.1016/0368-2048(96)02970-2

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

Recent developments of multilayer polychromators for the EUV and the soft x-ray range are reported. Upgrading and optimization of multilayers and filters, and a modular design boosted applications at various plasma facilities. Results of experiments with short-pulse (laser, liner) and tokamak plasmas are presented.

引用

页码：259 / 262

页数：4

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