Growth and characterization of LiNiVO4 thin film cathode by pulsed laser deposition

被引:5
|
作者
Tang, S. B. [1 ]
Lai, M. O. [1 ]
Lu, L. [1 ]
机构
[1] Natl Univ Singapore, Dept Mech Engn, Singapore 117675, Singapore
关键词
LiNiVO4 thin film; cathode; pulsed laser deposition; charge/discharge; capacity;
D O I
10.1016/j.tsf.2007.05.017
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Crystallized LiNiVO4 thin films have been prepared by pulsed laser deposition and then- physical and electrochemical properties have been studied. With the increase of deposition tem peratures and oxygen pressures, the crystallization became better, but accompanied with large sizes of grains. The initial discharge capacity of the film deposited at 873 K and 40 Pa of oxygen was just around 7.2 mu A h/cm(2) mu m when it was cycled between 3.0 and 4.8 V with a current density of 10 mu A h/cm(2). Cyclic voltammetry at a sweep rate of 0.1 mV/s showed a main anodic peak at 4.20 V, a weak anodic peak at 4.59 V and a cathodic peak located at 3.73 V. Based on the linear relationship between the peak currents of cathodic peaks and the square roots of scan rates, the diffusion coefficient was estimated to be about 2.3 x 10(-15) cm(2)/S. Electrochemical impedance spectra revealed high charge-transfer resistance of Li-ion, such as about 9000 Omega at 4.0 V. The extremely slow Li-ion diffusion and high charge-transfer resistance indicate that the electrochemical reaction in LiNiVO4 thin films is sluggish. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:1693 / 1698
页数:6
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